A Novel Probe Size Measurement Method for a Fine Electron Beam
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概要
- 論文の詳細を見る
A novel electron beam (EB) spot size measurement method is proposed. In this method, EB spot size is obtained from the relationship between the width of the trenches in the reference sample and the intensity profile of backscattered electrons. Selective chemical etching of a GaAlAs/GaAs superlattice produces an ideal structure for the reference sample. Such superlattice is fabricated by metalorganic chemical vapor deposition and trench widths are verified by transmission electron microscopy. Using 0.6μm deep and 8.5-65 nm wide trenches, nanometer-level EB spot sizes can be accurately measured.
- 社団法人応用物理学会の論文
- 1991-11-30
著者
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Nakayama Yoshinori
Central Research Laboratory Hitachi Lid.
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Okazaki Shinji
Central Research Lab. Hitachi Ltd.
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Nakayama Yoshinori
Central Research Lab., Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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