Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
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概要
- 論文の詳細を見る
The mix-and-match use of an electron-beam (EB) lithography system and an optical stepper is an effective approach to achieving higher resolution while maintaining high throughput in the fabrication of Gbit DRAMs and advanced ASIC devices. In this approach, the highly accurate alignment of patterns exposed by different lithography methods is essential. In this paper, the lens distortion of the optical stepper is examined and distorted patterns are aligned with an EB lithography system. The overlay accuracy in this mix-and-match application was 51.4 nm (3σ) which corresponds to Gbit DRAMs fabrication.
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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Matsuzaka Takashi
Central Research Laboratory Hitachi Ltd.
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中山 喜萬
阪大工
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Tanaka M
Mitsubishi Electric Co. Ltd. Hyogo Jpn
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SAITOU Norio
Central Research Laboratory, Hitachi, Ltd.
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KAWAHARA Toshio
Department of Materials Science and Engineering, National Defense Academy
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NAKAYAMA Yoshinori
Central Research Laboratory, Hitachi Ltd.
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Gotoh Y
Tokyo Univ. Sci. Chiba Jpn
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Gotoh Yasuko
Central Research Laboratory Hitachi Ltd.
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Gotoh Yoshikazu
Information Equipment Research Laboratory
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Nakayama Yoshinori
Central Research Laboratory Hitachi Lid.
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Tanaka M
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Saitou N
Central Research Laboratory Hitachi. Ltd.
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Saitou Norio
Central Reserch Labolatories Hitachi Ltd.
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Saitou Norio
Central Research Lab. Hitachi Ltd.
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HOJYO Yutaka
Instrument Division, Hitachi, Ltd.
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KAWAHARA Toshikazu
Instrument Division, Hitachi, Ltd.
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TAWA Tsutomu
Instrument Division, Hitachi, Ltd.
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Hojyo Yutaka
Instrument Division Hitachi Ltd.
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Tawa Tsutomu
Instrument Division Hitachi Ltd.
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Matsuzaki T
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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Kawahara Toshikazu
Instrument Division Hitachi Ltd.
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Nakayama Yoshinori
Central Research Lab., Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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