The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-12-30

著者

• Matsuzaka Takashi

  Central Research Laboratory Hitachi Ltd.

• Ota H

  Pioneer Corp. Saitama Jpn

• OHTA Hiroya

  Central Research Laboratory, Hitachi, Ltd.

• SAITOU Norio

  Central Research Laboratory, Hitachi, Ltd.

• KAWASAKI Katsuhiro

  Instrument Division, Hitachi, Ltd.

• KOHNO Toshihiko

  Musashi Works, Hitachi, Ltd.

• HOGA Morihisa

  Musashi Works, Hitachi, Ltd.

• Kawasaki K

  Tokyo Inst. Technol. Yokohama Jpn

• Kawasaki Koji

  Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology

• Kawasaki Koji

  Department Of Preventive And Community Dentistry Osaka Dental University

• Kawasaki Koji

  Department Of Electric And Electronic Engineering University Of Tokushima

• Ohta H

  Process Engineering Development Dept. Hitachi Ulsi Systems Co. Ltd.

• Ohta Hiroya

  Central Research Laboratory Hitachi Ltd.

• Saitou N

  Central Research Laboratory Hitachi. Ltd.

• Saitou Norio

  Central Reserch Labolatories Hitachi Ltd.

• Saitou Norio

  Central Research Lab. Hitachi Ltd.

• Hoga Morihisa

  Musashi Works Hitachi Ltd.

• Kohno T

  Tokyo Metropolitan Inst. Technol. Tokyo Jpn

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• The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
• Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
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