Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Defiectors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-06-30

著者

• OHTA Hiroya

  Central Research Laboratory, Hitachi, Ltd.

• SAITOU Norio

  Central Research Laboratory, Hitachi, Ltd.

• SOHDA Yasunari

  Central Research Laboratory, Hitachi, Ltd.

• Sohda Y

  Hitachi Ltd. Tokyo Jpn

• Ohta Hiroya

  Central Research Laboratory Hitachi Ltd.

• Saitou Norio

  Central Reserch Labolatories Hitachi Ltd.

• Saitou Norio

  Central Research Lab. Hitachi Ltd.

• Sohda Yasunari

  Central Research Laboratory Hitachi Ltd.

関連論文

• Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect
• The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
• Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
• Polymer Dissolution Characteristics of Radiation-Induced Grafted Resist in X-Ray Lithography
• Nanofabrication with a Novel EB System with a Large and Stable Beam Current
• Preparatory Study for the Matrix-Pattern Imaging, BE System
• Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Defiectors
• Analysis of Eddy Current Effects in an Electron Optical Column
• Cell Projection Lithography with Scattering Contrast
• Thermal Characteristics of Si Mask for EB Cell Projection Lithography
• Role of Ion Bombardment in Field Emission Current Instability
• Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
• Active Vibration Correction in Electron Beam Lithography System
• High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
• EB call projection Lithography : Lithography Technology
• Mask Fabrication with Submicron Line-Width by Electron Beam
• Fine Chromium Grating Directly Made by Irradiating Electron Beam
• Phase-Hologram Fabrication with a Computer-Controlled Electron Beam
• Monte Carlo Simulation for the Energy Dissipation Profiles of 5-20 keV Electrons in Layered Structures
• Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials
• Electron Beam Lithography-Present and Future
• Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope
• Analysis of Trapezoid Distortion due to Charge-Up in Electron Beam Recording
• Simulation of Limited-Area Cathode as Mask-Irradiation Source
• Measurements of Variable-Shaped Electron Beams with Solid-State Detector and Scattering Aperture
• Preparatory Study for the Matrix-Pattern Imaging, EB System
• Charge Modeling for Metal Layer on Insulating Substrate

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