Preparatory Study for the Matrix-Pattern Imaging, EB System

概要

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A new method for electron-beam lithography —called matrix-pattern imaging (MPI)— for use as a high-throughput exposure system has been proposed. In MPI, the electron sources are arranged in a matrix so that they produce an electron beam in the shape of a circuit-pattern element; the beam is focused on the target. An evaluation system for measuring the properties of the MIM cathode, a promising candidate for the electron source of an MPI-based system, was constructed. The measured current density (at the cathode) is 2.5 mA/cm2, and the brightness is $1\times 10^{2}$ A/cm2/sr (at an accelerating voltage of 50 kV). An image of the cathode was successfully projected onto the target, and delineated on a wafer. Moreover, the composition of the exposure system was optimized so as to increase throughput with an MIM cathode, and the throughput of the resulting MPI system was estimated as one six-inch reticle per hour.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2003-10-15