Phase-Hologram Fabrication with a Computer-Controlled Electron Beam
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1971-11-05
著者
-
SAITOU Norio
Central Research Laboratory, Hitachi, Ltd.
-
Miura Yoji
Central Research Laboratory Hitachi Ltd.
-
Honda Yukio
Central Research Laboratory Hitachi Ltd.
-
Saitou Norio
Central Research Laboratory Hitachi Ltd.
-
Saitou Norio
Central Research Lab. Hitachi Ltd.
-
Maekawa Akiji
Central Research Laboratory Hitachi Ltd.
関連論文
- Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect
- The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
- Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
- A Magnetic Force Microscope Using an Optical Lever Sensor and Its Application to Longitudinal Recording Media
- Preparatory Study for the Matrix-Pattern Imaging, BE System
- Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Defiectors
- Analysis of Eddy Current Effects in an Electron Optical Column
- Cell Projection Lithography with Scattering Contrast
- Distortion of Electron-Beam-Recorded Patterns on a Photographic Plate due to Charge-Up
- Recorded Magnetization Structures and Noise Characteristics of CoCr Alloy Longitudinal Thin-Film Media
- Phase Controlled Scanning Force Microscope
- High Resolution of Magnetic Force Microscope Image using a Just-on-Surface Magnetic Force Microscope
- Study of Magnetic Stray Field Measurement on Surface Using New Force Microscope
- Simultaneous Observation of 3-Dimensional Magnetic Stray Field and Surface Structure Using New Force Microscope
- Magnetic and Microstructural Properties of Co-Cr Film Fabricated by Continuous Roll Coater : Magnetism, Magnetic Materials Devices
- Observation of Magnetization Structure on Co-Cr Perpendicular Magnetic Recording Media by Bitter and Electron Holography Methods
- Comparison of Microstructure of Cross-Sectional CoCr Thin Film Specimens Prepared by Fracture, Microtome, and Ion-Beam Thinning Methods
- Microstructure of CoCr Thin Films Prepared by Sputtering
- Thermal Characteristics of Si Mask for EB Cell Projection Lithography
- Role of Ion Bombardment in Field Emission Current Instability
- Effects of Carbon Intermediate Layer on Structural and Magnetic Properties of Double-Layered Perpendicular Magnetic Recording Media(Special Issue on Recent Progress in Information Storage Technology)
- Effect of Nonmagnetic Underlayer on Structural and Magnetic Properties of CoCr-Alloy Thin Film Media(Special Issue on Selected Papers from the 5th Asian Symposium on Information Storage Technology)
- Spectrum Analysis of Recorded Magnetization Using Magnetic Force Microscopy
- Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
- Active Vibration Correction in Electron Beam Lithography System
- High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
- EB call projection Lithography : Lithography Technology
- Mask Fabrication with Submicron Line-Width by Electron Beam
- Fine Chromium Grating Directly Made by Irradiating Electron Beam
- Computer Hologram Recording with an Electron Beam
- Phase-Hologram Fabrication with a Computer-Controlled Electron Beam
- Monte Carlo Simulation for the Energy Dissipation Profiles of 5-20 keV Electrons in Layered Structures
- Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials
- Preparation of YBa_2Cu_3O_ Thin Films by Heat-Oxidation of Vacuum-Deposited Multilayer Metallic Films : Electrical Properties of Condensed Matter
- Single Crystal Growth of Lanthanum Hexaboride in Molten Aluminium
- Electron Beam Lithography-Present and Future
- Analysis of Trapezoid Distortion due to Charge-Up in Electron Beam Recording
- Preparatory Study for the Matrix-Pattern Imaging, EB System