Mask Fabrication with Submicron Line-Width by Electron Beam

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1971-10-05

著者

• SAITOU Norio

  Central Research Laboratory, Hitachi, Ltd.

• MAEKAWA Akiji

  Central Research Laboratory, Hitatchi Ltd.

• Saitou Norio

  Central Research Laboratory Hitachi Ltd.

• Saitou Norio

  Central Research Lab. Hitachi Ltd.

• Maekawa Akiji

  Central Research Laboratory Hitachi Ltd.

• NONOGAKI Saburo

  Central Research Laboratory, Hitachi Ltd.

• Nonogaki Saburo

  Central Research Laboratory Hitachi Ltd.

• MORISHITA Hajime

  Central Research Laboratory, Hitachi, Ltd.

• ITOH Hisatsugu

  Central Research Laboratory, Hitachi, Ltd.

• Morishita Hajime

  Central Research Laboratory Hitachi Ltd.

• Itoh Hisatsugu

  Central Research Laboratory Hitachi Ltd.

• NONOGAKI Saburo

  Central Research Laboratory, Hitachi, Ltd.

関連論文

• Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect
• The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
• Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
• Preparatory Study for the Matrix-Pattern Imaging, BE System
• Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Defiectors
• Analysis of Eddy Current Effects in an Electron Optical Column
• Cell Projection Lithography with Scattering Contrast
• Distortion of Electron-Beam-Recorded Patterns on a Photographic Plate due to Charge-Up
• Thermal Characteristics of Si Mask for EB Cell Projection Lithography
• Role of Ion Bombardment in Field Emission Current Instability
• PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist
• Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
• Active Vibration Correction in Electron Beam Lithography System
• High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
• EB call projection Lithography : Lithography Technology
• High-Resolution Proximity Exposure through a Phase Shifter Mask
• Mask Fabrication with Submicron Line-Width by Electron Beam
• Fine Chromium Grating Directly Made by Irradiating Electron Beam
• Computer Hologram Recording with an Electron Beam
• Phase-Hologram Fabrication with a Computer-Controlled Electron Beam
• Monte Carlo Simulation for the Energy Dissipation Profiles of 5-20 keV Electrons in Layered Structures
• Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials
• Improvement of Pulse Response in Computer-Controlled Electron Gun
• Electron Beam Lithography-Present and Future
• Analysis of Trapezoid Distortion due to Charge-Up in Electron Beam Recording
• A Rigorous Solution of Two-Dimensional Diffraction Based on the Huygens-Fresnel Principle
• Preparatory Study for the Matrix-Pattern Imaging, EB System

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