PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist

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Sn-Sb-Se/Sb-Bi Bilayer Phase-Change Media for High-Density Write-Once Optical Recording
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Analysis of Leading Edge/Trailing Edge Independent Detection Method in Optical Disk
Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
Effect of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below
Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
Formation of Fractionated Novolak Resin Langmuir-Blodgett Films
PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist
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Dissolution Behavior of Novolak/Dissolution Inhibitor Resist Systems in an Aqueous Base Developer
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The oxygen gas permselectivity of dried cellulose acetate membranes.

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