Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction

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概要

• 論文の詳細を見る

• Negative resist systems composed of a novolak resin, diphenylsilanediol (Ph_2Si(OH)_2) and an acid generator are investigated for i-line lithography. The reaction in this resist system is based on an acid-catalyzed condensation reaction; the acid produced in the exposed area induces a condensation reaction of Ph_2Si(OH)_2 during post-exposure baking. The condensation product, siloxane, acts as an aqueous-base dissolution inhibitor, while silanol compounds in unexposed areas work as dissolution accelerators. The resist composed of a novolak resin, Ph_2Si(OH)_2 and 2-naphthoylmethyl-tetramethylenesulfonium hexafluoroantimonate (NMTMS-SbF_6) shows a sensitivity of about 200 mJ/cm^2 at 365 nm. This sensitivity is lower than that at 248 nm when triphenylsulfonium triflate (Ph_3S^+OTf^-) is used as an acid generator, which can be ascribed to the low quantum yield of acid generation from NMTMS-SbF_6. Using this resist, 0.3 μm space patterns with 1 μm film thickness were obtained by combining an i-line stepper with a phase-shifting mask.

• 社団法人応用物理学会の論文
• 1990-11-20

著者

• Hayashi Nobuo

  University Of Electro-communications

• Tanaka T

  Department Of Electric And Electronic Engineering Toyohashi University Of Technology

• UENO Tomo

  Faculty of Technology, Tokyo University of Agriculture and Technology

• Shiraishi H

  National Res. Inst. Metals

• Shiraishi Hiroshi

  Central Research Laboratory Hitachi Ltd.

• TANAKA Toshihiko

  Central Research Laboratory, Hitachi, Ltd.

• UENO Takumi

  Central Research Laboratory, Hitachi Ltd.

• Hayashi N

  Saga Univ. Saga Jpn

• Ueno T

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• HAYASHI Nobuaki

  Central Research Laboratory, Hitachi Ltd.

• IWAYANAGI Takao

  Central Research Laboratory, Hitachi Ltd.

• TADANO Keiko

  Central Research Laboratory, Hitachi Ltd

• Tadano K

  Central Research Laboratory Hitachi Ltd

• Tadano Keiko

  Central Research Laboratory Hitachi Ltd

• Shiraishi Hiroshi

  Central Research Lab. Hitachi Ltd.

• Shiraishi Hiroshi

  Central Research Laboratory Hitachi Ltd

• Iwayanagi Takao

  Central Research Laboratory Hitachi Ltd.

• Tanaka Toshihiko

  Central Research Laboratory, Hitachi Ltd.

• HAYASHI Nobuyuki

  University of Electro-communications

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