Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone : Effect of Polymer Structure
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概要
- 論文の詳細を見る
In order to understand the basic mechanisms working in the dissolution of phenolic resin / diazonaphthoquinone (DNQ) positive photoresists, several polyhydroxystyrene derivatives have been studied in terms of their dissolution capabilities. The influence of the structure and the molecular weight distributions of phenolic resins on the inhibition effect were examined. In phenolic resins which have alkyl groups ortho to the hydroxy group a strong dissolution inhibition effect is found. As for the molecular weight distribution, the mixtures of a higher-molecular-weight polymer with lower dissolution rate and a lower-molecular-weight polymer with higher dissolution rate give strong dissolution inhibition by DNQ.
- 社団法人応用物理学会の論文
- 1991-11-30
著者
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Hayashi Nobuo
University Of Electro-communications
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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UENO Tomo
Faculty of Technology, Tokyo University of Agriculture and Technology
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Shiraishi H
National Res. Inst. Metals
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Shiraishi Hiroshi
Central Research Laboratory Hitachi Ltd.
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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UENO Takumi
Central Research Laboratory, Hitachi Ltd.
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Hayashi N
Saga Univ. Saga Jpn
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Ueno T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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HAYASHI Nobuaki
Central Research Laboratory, Hitachi Ltd.
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IWAYANAGI Takao
Central Research Laboratory, Hitachi Ltd.
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Shiraishi Hiroshi
Central Research Lab. Hitachi Ltd.
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Shiraishi Hiroshi
Central Research Laboratory Hitachi Ltd
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Iwayanagi Takao
Central Research Laboratory Hitachi Ltd.
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HAYASHI Nobuyuki
University of Electro-communications
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