Determination of Acid Diffusion in Chemical Amplification Positive Deep-UV Resists
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概要
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The diffusion of photogenerated acid in chemical amplification resist systems was examined by a newly developed method which allowed an estimation of the diffusion range by simple means. The acid mobility was investigated for various process conditions. It was found that prebake and post-exposure-bake conditions have strong influence on the mobility of acid. The diffusion range of acid is much larger than values estimated from the catalytic volume. Large differences in diffusion characteristics were found for two different resist systems. The diffusion of various sulfonic acids decreased strongly with increasing molecule size.
- 社団法人応用物理学会の論文
- 1991-11-30
著者
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Hayashi Nobuo
University Of Electro-communications
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Schlegel Leo
Central Research Laboratory Hitachi Ltd.
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UENO Tomo
Faculty of Technology, Tokyo University of Agriculture and Technology
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UENO Takumi
Central Research Laboratory, Hitachi Ltd.
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Hayashi N
Saga Univ. Saga Jpn
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Ueno T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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HAYASHI Nobuaki
Central Research Laboratory, Hitachi Ltd.
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IWAYANAGI Takao
Central Research Laboratory, Hitachi Ltd.
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Iwayanagi Takao
Central Research Laboratory Hitachi Ltd.
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HAYASHI Nobuyuki
University of Electro-communications
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