Effect of Deuterium Anneal on SiO_2/Si(100) Interface Traps and Electron Spin Resonance Signals of Ultrathin SiO_2 Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-04-15
著者
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OHDOMARI Iwao
School of Science and Engineering, Waseda University
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Kawarada Hiroshi
School Of Science And Engineering Waseda University
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Kawarada Hiroshi
School Of Science & Engineering Waseda University
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大泊 巌
早大理工
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Ohdomari Iwao
School Of Science And Engineering Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami-memorial Laboratory For Materials Science
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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UENO Tomo
Faculty of Technology, Tokyo University of Agriculture and Technology
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Kawarada H
School Of Science And Engineering Waseda University
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Ueno T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Kawarada Hiroshi
Nanotechnology Research Center Waseda University
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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Ueno Tomo
Faculty Of Technology Tokyo University Of Agriculture And Technology
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