Low-Pressure Diamond Nucleation and Growth on Cu Substrate

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概要

• 論文の詳細を見る

• We present a new technique for providing nuclei for diamond formation on nondiamond substrates and its application to the growth of diamond on a Cu substrate by chemical vapor deposition (CVD). This is a predeposition process in which the substrate is immersed in a CH_4/H_2 plasma formed by electron cyclotron resonance at a low pressure (0.1 Torr). The technique provides possibilities of nucleation over an increased area at temperatures lower (about 500℃) than usual, as well as improved process controllability. The grown diamonds on Cu exhibit a morphology significantly different from that of diamonds grown on Si.

• 社団法人応用物理学会の論文
• 1993-02-01

著者

• Kawarada Hiroshi

  School Of Science & Engineering Waseda University

• YAMAGUCHI Akira

  Department of Chemistry, Graduate School of Science, Tohoku University

• 吉原 章

  石巻専修大 理工

• KAWARADA Hiroshi

  Department of Electrical Engineering, Faculty of Engineering, Osaka University

• Kawarada H

  School Of Science And Engineering Waseda University

• ISHIKURA Takefumi

  Frontier Technology Laboratory, Research and Development Department, Tokyo Gas Co. Ltd.

• YAMASHITA Satoshi

  Frontier Technology Laboratory, Research and Development Department, Tokyo Gas Co. Ltd.

• Yamashita Satoshi

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• KATAOKA Kazuhiro

  Department of Microbiology, Faculty of Pharmaceutical Sciences, Kyushu University

• OJIKA Shin-ichi

  R & D Division, Tokyo Reinetsu Sangyo Co., Ltd.

• KATAOKA Kazuhiro

  R & D Division, Tokyo Reinetsu Sangyo Co., Ltd.

• Kawarada Hiroshi

  Nanotechnology Research Center Waseda University

• Yamashita S

  Tohoku Univ.

• Ojika Shin-ichi

  R & D Division Tokyo Reinetsu Sangyo Co. Ltd.

• Kataoka Kazuhiro

  Department Of Microbiology Faculty Of Pharmaceutical Sciences Kyushu University

• Ishikura T

  Tokyo Gas Co. Ltd. Yokohama Jpn

• Ishikura Takefumi

  Frontier Technology Laboratory Research And Development Department Tokyo Gas Co. Ltd.

• Yamaguchi Akira

  Department Of Chemistry Graduate School Of Science Tohoku University

• Yamashita Satoshi

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• Yamaguchi Akira

  Department Of Biology Faculty Of Science Hirosaki University

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