Effects of Plasma Potential on Diamond Deposition at Low Pressure Using Magneto-Microwave Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-06-15
著者
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Kawarada Hiroshi
School Of Science And Engineering Waseda University
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Kawarada Hiroshi
School Of Science & Engineering Waseda University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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MA Jing
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Suzuki J
Tokyo Inst. Technol. Tokyo Jpn
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Wei Jin
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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SUZUKI Jun-ichi
Shimadzu Co.
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Suzuki J
Tohoku Univ. Sendai Jpn
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Kawarada H
School Of Science And Engineering Waseda University
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Suzuki Jun-ichi
Industrial Machinery Division Shimadzu Corp.
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Hiraki A
Kochi Univ. Technol. Kochi‐ken Jpn
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Ma J
Osaka Univ. Osaka
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Ma Jing
Department Of Chemistry Faculty Of Engineering Gifu University
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Kawarada Hiroshi
Nanotechnology Research Center Waseda University
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Wei Jin
Department of Cardiology, Second Affiliated Hospital, School of Medicine, Xi'an Jiaotong University
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