Fabrication of Si:H Alloy with Plenty of -SiH_3 by Reactive Sputtering onto Low Temperature Substrate
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-09-20
著者
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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ABE Yuji
Department of Surgery, Kitakyushu Municipal Medical Center
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Abe Yuji
Department Of Obstetrics And Gynecology Toho University School Of Medicine
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Tokumura Masao
The Institute Of Scientific And Industrial Research Osaka University
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MIYASATO Tatsuro
The Institute of Scientific and Industrial Research, Osaka University
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Miyasato Tatsuro
The Institute Of Scientific And Industrial Research Osaka University
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Abe Yuji
Department Of Chest Surgery Kitakyushu Municipal Medical Center
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Abe Yuji
Department Of Electrical Engineering Osaka University
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Abe Yuji
Department Of Biofunctional Research National Institutefor Longeviiy Sciences
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TOKUMURA Masao
The Institute of Scientific and Industrial Research, Osaka University
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
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