Epitaxial Growth of CdTe by H_2 Sputtering : Semiconductors and Semiconductor Devices

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1988-10-20

著者

• SAITO Koji

  Department of Physics, Tokai University

• OSAKA Yukio

  Department of Electrical Engineering, Hiroshima University

• Sato K

  Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology

• Saito K

  Department Of Materials Technology Chiba University

• IMURA Takeshi

  Department of Electrical Engineering, Osaka University

• Sato K

  Department Of Electronics And Information Science Teikyo University Of Science And Technology

• Saito K

  Nagaoka National Coll. Technol. Nagaoka Jpn

• Osaka Y

  Hiroshima Kokusaigakuin Univ. Hiroshima Jpn

• Osaka Yukio

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Imura T

  Mitsubishi Paper Mills Ltd.

• Imura T

  Department Of Electrical Engineering Hiroshima University

• Imura Takeshi

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• Nishibayashi Y

  Sumitomo Electric Industries Ltd. Hyogo

• NISHIBAYASHI Yoshiki

  Department of Electrical Engineering, Hiroshima University

• TOKUMITSU Yoji

  Department of Electrical Engineering, Hiroshima University

• Saito K

  Application Laboratory

• Saito K

  Av-it Development Group. Sony Corporation

• Saito Koji

  Department Of Gastroenterology Yamagata University School Of Medicine

• Tokumitsu Y

  Department Of Electrical Engineering Hiroshima University

• Tokumitsu Yoji

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Saito Koji

  Department Of Anesthesiology And Intensive Care Medicine Tohoku University Hospital

• Imura Takeshi

  Department of Chemistry, Faculty of Engineering Science, Osaka University

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