Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-10-15
著者
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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Osaka Y
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Osaka Y
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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OKAMOATO Masaki
Department of Electrical Engineering, Hiroshima University
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UTSUMI Yoshiharu
Department of Electrical Engineering, Hiroshima University
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Utsumi Y
Hitachi Ltd. Ibaraki Jpn
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Utsumi Yoshiharu
Department Of Electrical Engineering Hiroshima University
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Okamoato Masaki
Department Of Electrical Engineering Hiroshima University
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OSAKA Yukio
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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