Evaluation of Epitaxial ZnTe Films Prepared by RF Sputtering by Means of Ion Beam Channeling
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-06-20
著者
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Nishiyama Fumitaka
Department Of Electrical Engineering Hiroshima University
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Nishiyama Fumitaka
Department Of Applied Physics And Chemistry Hiroshima University
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Osaka Y
Department Of Electrical Engineering Hiroshima-denki Institute Of Technology
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Osaka Y
Hiroshima Kokusaigakuin Univ. Hiroshima Jpn
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Imura T
Mitsubishi Paper Mills Ltd.
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Imura T
Department Of Electrical Engineering Hiroshima University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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KURIBAYASHI Hiromitsu
WaferMasters, Inc.
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TOKUMITSU Yoji
Department of Electrical Engineering, Hiroshima University
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Kawabuchi Akira
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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KITAYAMA Haruyuki
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Kitayama Haruyuki
Wafermasters Inc.
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Tokumitsu Y
Department Of Electrical Engineering Hiroshima University
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Tokumitsu Yoji
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Kawabuchi Akira
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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OSAKA Yukio
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
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