Evaluation of Fermi-Level in Doped Films of a-SiC:H by X-Ray Photoemission Spectroscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-11-20
著者
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Fukada Noboru
Central Research Laboratory, Kanegafuchi Chemical Industry Co., Ltd.
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FUKADA Noboru
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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FUKUSHIMA Yoshito
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Hiraki A
Kochi Univ. Technol. Kochi‐ken Jpn
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Fukada N
Kanegafuchi Chemical Industry Co. Ltd. Kobe Jpn
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Imura T
Mitsubishi Paper Mills Ltd.
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Imura T
Department Of Electrical Engineering Hiroshima University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Fukushima Yoshito
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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