Initial Oxidation Process of Anodized Porous Silicon with Hydrogen Atoms Chemisorbed on the Inner Surface : Surfaces, Interfaces and Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-08-20
著者
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ITO Toshimichi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Kato Y
Department Of Electrical Engineering Osaka University
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KATO Yoshitaka
Department of Electrical Engineering, Osaka University
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Ito Toshimichi
Department Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka
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Kato Yoshitaka
Department of Civil Engineering, Faculty of Science and Technology, Tokyo University of Science, Tokyo, Japan.
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