CVD growth and field emission characteristics of various types of nano-structured carbon films
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概要
- 論文の詳細を見る
Various types of nano-structured carbon films were successfully deposited on Si wafers by microwave plasma chemical vapour deposition method. It is found from electron microscope observations and Raman spectroscopy that these films include differently-structured nano-carbon sheets, and sometimes carbon needles formed on diamond particles deposited on the Si substrate. Field emission (FE) characteristics taken from such films indicate that FE currents larger than 50mA/cm^2 were obtained at a low macroscopic electric field of 3.6V/μm.
- 社団法人電子情報通信学会の論文
- 2006-07-27
著者
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ITO Toshimichi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Ito Toshimichi
Department Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka
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WANG Jiayu
Department of Electrical Engineering, Graduate School of Engineering, Osaka University
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Wang Jiayu
Department Of Electrical Engineering Graduate School Of Engineering Osaka University
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