Fabrication of Diamond Films at Low Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chermical Vapor Deposition (<Special Issue> Plasma Processing)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-30
著者
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HATTA Akimitsu
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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ITO Toshimichi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Hiraki A
Faculty Of Engineering University Of The Ryukyus
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Suzuki J
Tokyo Inst. Technol. Tokyo Jpn
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Suzuki J
Tohoku Univ. Sendai Jpn
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Mori H
Osaka Univ. Osaka Jpn
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MAKITA Hiroshi
Kochi University of Technology
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Suzuki Jun-ichi
Industrial Machinery Division Shimadzu Corp.
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YARA Takuya
Department of Electrical Engineering, Osaka University
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YUASA Motokazu
Kyoto Technology Center, Sekisui Chemical Co., Ltd.
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SHIMIZU Manabu
Department of Electrical Engineering, Osaka University
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MAKITA Hiroshi
Department of Electrical Engineering, Osaka University
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Yara Takuya
Department Of Electrical Engineering Osaka University
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Mori H
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Ito Toshimichi
Department Of Electrical Engineering Faculty Of Engineering Osaka University:cooperative Research Ce
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Ito Toshimichi
Department Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka
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Ito Toshimichi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Makita Hiroshi
Department Of Chemical Engineering Kyoto University
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Yuasa M
Kyoto Univ. Kyoto Jpn
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Hatta Akimitsu
Department Of Electrical Engineering Osaka University:(present Address)department Of Electronic And
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Shimizu Manabu
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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Shimizu Manabu
Department Of Electrical Engineering Osaka University
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