Spontaneous Inclusion of Oxygen in Sputter-Deposited Amorphous Silicon during and after Fabrication
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-02-05
著者
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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Hiraki Akio
Department Of Electrical Engineering Osaka University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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USHITA Katsumi
Department of Electrical Engineering, Osaka University
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Ushita Katsumi
Department Of Electrical Engineering Osaka University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Imura Takeshi
Department of Chemistry, Faculty of Engineering Science, Osaka University
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