Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1987-05-20

著者

• OSAKA Yukio

  Department of Electrical Engineering, Hiroshima University

• Ueda M

  Tokyo Inst. Technol. Tokyo Jpn

• Ueda M

  Univ. Tokushima Tokushima Jpn

• Ueda M

  The Institute Of Scientific And Industrial Research Osaka University

• UEDA Masato

  Department of Applied Chemistry, Faculty of Engineering, Osaka Institute of Technology

• IMURA Takeshi

  Department of Electrical Engineering, Osaka University

• Osaka Yukio

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Imura T

  Mitsubishi Paper Mills Ltd.

• Imura T

  Department Of Electrical Engineering Hiroshima University

• Imura Takeshi

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• Ueda Masahiro

  Department Of Techniques Faculty Of Education Fukui University

• Imura Takeshi

  Department of Chemistry, Faculty of Engineering Science, Osaka University

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