Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-30
著者
-
UEDA Mitsuru
Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu
-
Arai Tadashi
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
-
Ueda M
Tokyo Inst. Technol. Tokyo
-
Ueda M
Tokyo Inst. Technol. Tokyo Jpn
-
Ogata Toshiyuki
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
-
HIRAYAMA Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
-
SHIONO Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
-
MATSUMARU Shogo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
-
HADA Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
-
ONODERA Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
-
SAKAMIZU Toshio
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
-
YAMAGUCHI Atsuko
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
-
SHIRAISHI Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
-
FUKUDA Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
-
Matsumaru Shogo
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
-
Shiraishi H
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
-
Fukuda Hiroshi
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
-
Ueda Mitsuru
Department Of Human Sensing And Functional Sensor Engineering Graduate School Of Engineering Yamagat
-
Onodera J
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
-
Yamaguchi Atsuko
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
-
Ueda Mitsuru
Department Of Chemistry Graduate School Of Pure And Applied Sciences University Of Tsukuba
-
Fukuda Hiroshi
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
関連論文
- Control of Pore Size in Mesoporous Silica by Incremental Surface Modification Using Tetramethyl Orthosilicate
- Mechanical and Dielectric Properties of a New Polymer Blend Composed of 1, 2-Bis (vinylphenyl) ethane and Thermosetting Poly (phenylene ether) Copolymer Obtained from 2, 6-Dimethylphenol and 2-Allyl-6-methylphenol
- A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2',6,6'-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone
- Synthesis and Properties of a Novel High Sensitive Photo-Radical Initiator Based on Biphenyl-2,2'-Dicarboximide Derivatives
- Chemically Amplified Photosensitive Poly(benzoxazole)
- New Convenient Synthetic Route for Photosensitive Poly(benzoxazole)
- Direct Synthesis of Photosensitive Poly(benzoxazole)
- Highly Transparent Photosensitive Polybenzoxazole : Poly(o-hydroxy amide) Derived from 4,4'-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides
- Thermo-base Generator for Low Temperature Solid-phase Imidation of Poly(amic acid)
- A Novel Low Temperature Curable Photosensitive Polybenzoxazole
- Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution
- An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide)
- Efficient Catalyst for Low Temperature Solid-Phase Imidization of Poly(amic acid)
- Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
- Solution-processible Fluorinated Carbazole Derivative for Phosphorescent Organic Light-emitting Diodes
- Synthesis and Properties of 3,8-Bis[4-(9H-carbazol-9-yl)phenyl]-1,10-phenanthroline for Phosphorescent OLEDs
- Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
- Effect of Hydrogen Dilution on Structure of a-Si:H Prepared by Substrate Impedance Tuning Technique : Condensed matter
- Microcrystallization in P-Doped Si:H Films at High Deposition Rate
- Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate
- Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate
- Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
- Annealing Effect on Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate by Substrate Impedance Tuning Technique
- Effect of Annealing on Hydrogenated Amorphous Silicon Prepared at High Deposition Rate
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- Acid-breakable Resin-based Resist for Nanofabrication Electron-beam Lithography
- New Positive - Type Photosensitive Poly(phenylene ether): Poly(2 - hydroxy - 6 - methylphenol - co - 2, 6 - dimethylphenol) with Diazonaphthoquinone
- Synthesis of High Refractive Index Poly(thioether sulfone)s with High Abbe's Number Derived from 2,5-Bis(sulfanylmethyl)-1,4-dithiane
- A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator
- Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
- Influence of Polymer Structure in Sulfonated Block Copoly(ether sulfone) Membranes for Fuel Cell Application
- Positive-Working Alkaline Developable Photosensitive and Second-Order Nonlinear Optical Polyimide
- Photosensitive Polyimides with Second-Order Nonlinear Optical Property
- Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines
- Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone
- Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex
- Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator
- Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units
- New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
- Synthesis of Hyperbranched Aromatic Polyamide by Direct Polycondensation Method
- Constitutional Isomerism IV. Synthesis and Characterization of Poly(amide-ester)s From Isophthaloyl Chloride and 4-Aminophenethyl Alcohol
- Compatibility of Polyether Sulfone and Polymide Derived from Isomerization of Polysoimide. An Approach to In-Situ Generated Rigid-Rod Molecular Composite
- In situ Formed Three Layer Film by Isomerization of Fluorinated Polyisoimide in Polyethersulfone as a Matrix Polymer
- Outgassing Analysis in EUV Resist
- New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
- Characteristics of CA Resist in EUV Lithography
- Synthesis and Characterization of Calix[4]resorcinearene Bearing Azobenzene Moieties as Novel Photofunctional Materials
- A Positive-Working Alkaline Developable Photosensitive Polyimide for Second-Order Nonlinear Optics
- Density Functional Theory Calculations of Photoabsoption Spectra of Organic Molecules in the Vacuum Ultraviolet Region
- DFT Calculations of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157nm Lithography
- Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index
- Synthesis of block copolymers consisting of poly(3-hexylthiophene) and polystyrene segments through ionic interaction and their self-assembly behavior
- A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
- Convenient Synthesis of Poly(butylene succinate) Catalyzed by Distannoxane
- Synthesis of Poly (3-hexylthiophene) by Using the VO(acac)_2-FeCl_3-O_2 Catalytic System
- A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator
- Control of Molecular Weight Distribution in Polycondensation Polymers. Polyamide Synthesis
- New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator
- New Positive-Type Photosensitive Polyimide: Hyperbranched Poly(Ether-Imide)with Diazonaphthoquinone
- Chemoselective Polyamidation of 3,3'-Dihydroxybenzidine
- P-93 Synthetic studies of biselides and haterumalides
- Oxidative Coupling Polymerization of 2, 6-Dimethylphenol with a Copper-Amine Catalyst Immobilized within the Interior of SBA-15
- Synthesis of Novel Glass-Forming Liquid Crystals Containing Acrylic Acid Trimer Core Unit and Mesogenic Moiety, and Their Use in Cholesteric Reflection Films
- Synthesis of Hyperbranched Aromatic Poly(ether sulfone) with Sulfonyl Chloride Terminal Groups
- Facile Synthesis of Novel Monodisperse Liquid-crystalline Oligomers Based on Michael Adducts from Millipede Cyanoacetates
- Synthesis of Thermotropic Liquid Crystalline Polyimides with Siloxane Linkages
- Synthesis of Poly(aryl ether) by Pd-Catalyzed Polycondensation
- Synthesis of Aramids by Polycondensation of Aromatic Dicarboxylic Acids with Aromatic Diamines Containing Ether Linkages
- Synthesis of Poly(naphthylene ether) Containing Tetraphenylmethane Group with a Low Dielectric Constant
- Direct Patterning of Poly(ether ether sulfone) Using a Cross-linker and a Photoacid Generator
- Synthesis of Sulfonated Poly (1, 4-diphenoxybenzene) for Proton Exchange Membrane
- Recent Progress of Photosensitive Polyimides
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Synthesis of Poly (N-fluoroalkyl benzamide) with Controlled Molecular Weight and Polydispersity Index
- A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix [4] resorcinarene and a Photoacid Generator
- Recent Development of Photosensitive Polybenzoxazoles
- pH-responsive Dendritic Gelators
- Synthesis of hyperbranched polymers with controlled degree of branching
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- 3,3'-(Phenylphosphinylidene)bis(2(3H)-benzoxazolone) and 3,3'-(phenylphosphinylidene)bis(2(3H)-benzothiazolone). New activating agents.
- N,N'-Carbonyldi(1,2-benzisoxazol-3(2H)-one): New, reactive condensing agent.
- Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone
- "Face-On" Oriented π-Conjugated Polymers Containing 1,3,4-Thiadiazole Moiety Investigated with Synchrotron GIXS Measurements: Relationship between Morphology and PSC Performance