UEDA Mitsuru | Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu

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概要

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著作論文

Control of Pore Size in Mesoporous Silica by Incremental Surface Modification Using Tetramethyl Orthosilicate
Mechanical and Dielectric Properties of a New Polymer Blend Composed of 1, 2-Bis (vinylphenyl) ethane and Thermosetting Poly (phenylene ether) Copolymer Obtained from 2, 6-Dimethylphenol and 2-Allyl-6-methylphenol
A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2',6,6'-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone
Synthesis and Properties of a Novel High Sensitive Photo-Radical Initiator Based on Biphenyl-2,2'-Dicarboximide Derivatives
Highly Transparent Photosensitive Polybenzoxazole : Poly(o-hydroxy amide) Derived from 4,4'-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides
Thermo-base Generator for Low Temperature Solid-phase Imidation of Poly(amic acid)
A Novel Low Temperature Curable Photosensitive Polybenzoxazole
Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution
An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide)
Efficient Catalyst for Low Temperature Solid-Phase Imidization of Poly(amic acid)
Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
Solution-processible Fluorinated Carbazole Derivative for Phosphorescent Organic Light-emitting Diodes
Synthesis and Properties of 3,8-Bis[4-(9H-carbazol-9-yl)phenyl]-1,10-phenanthroline for Phosphorescent OLEDs
Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
New Positive - Type Photosensitive Poly(phenylene ether): Poly(2 - hydroxy - 6 - methylphenol - co - 2, 6 - dimethylphenol) with Diazonaphthoquinone
Synthesis of High Refractive Index Poly(thioether sulfone)s with High Abbe's Number Derived from 2,5-Bis(sulfanylmethyl)-1,4-dithiane
A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator
Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines
A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
Influence of Polymer Structure in Sulfonated Block Copoly(ether sulfone) Membranes for Fuel Cell Application
Positive-Working Alkaline Developable Photosensitive and Second-Order Nonlinear Optical Polyimide
Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines
Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone
Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex
Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator
Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units
New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
Synthesis of Hyperbranched Aromatic Polyamide by Direct Polycondensation Method
Constitutional Isomerism IV. Synthesis and Characterization of Poly(amide-ester)s From Isophthaloyl Chloride and 4-Aminophenethyl Alcohol
Compatibility of Polyether Sulfone and Polymide Derived from Isomerization of Polysoimide. An Approach to In-Situ Generated Rigid-Rod Molecular Composite
In situ Formed Three Layer Film by Isomerization of Fluorinated Polyisoimide in Polyethersulfone as a Matrix Polymer
Density Functional Theory Calculations of Photoabsoption Spectra of Organic Molecules in the Vacuum Ultraviolet Region
Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index
Synthesis of block copolymers consisting of poly(3-hexylthiophene) and polystyrene segments through ionic interaction and their self-assembly behavior
A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
Convenient Synthesis of Poly(butylene succinate) Catalyzed by Distannoxane
Synthesis of Poly (3-hexylthiophene) by Using the VO(acac)_2-FeCl_3-O_2 Catalytic System
A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator

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