Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator

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概要

• 論文の詳細を見る
• Society of Polymer Science, Japanの論文
• 2007-03-15

著者

• UEDA Mitsuru

  Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu

• Shibasaki Yuji

  Department Of Organic And Polymeric Materials Tokyo Institute Of Technology

• Shibasaki Y

  Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti

• Shibasaki Yuji

  Department Of Chemistry & Bioengineering Faculty Of Engineering Iwate University

• Shibasaki Y

  Tokyo Inst. Of Technol. Tokyo

• UEDA Mitsuru

  Tokyo Institute of Technology

• Ueda Mitsuru

  Tokyo Inst. Of Technol. Tokyo Jpn

• Ueda Mitsuru

  Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti

• OGURA Tomohito

  Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Ins

• Ogura Tomohito

  Department Of Organic & Polymeric Materials Graduate School Of Science & Engineering Tokyo I

• Ueda Mitsuru

  Department Of Human Sensing And Functional Sensor Engineering Graduate School Of Engineering Yamagat

• YAMAGUCHI Ko-ta

  Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu

• Yamaguchi Ko-ta

  Department Of Organic & Polymeric Materials Graduate School Of Science & Engineering Tokyo I

• Ueda Minoru

  Department Of Organic And Polymeric Materials Tokyo Institute Of Technology

• Ogura Tomohito

  Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti

• Ueda Mitsuru

  Department Of Chemistry Graduate School Of Pure And Applied Sciences University Of Tsukuba

• Ogura Tomohito

  Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti

関連論文

• Control of Pore Size in Mesoporous Silica by Incremental Surface Modification Using Tetramethyl Orthosilicate
• New Positive-type Photosensitive Polyimide Having Sulfo Groups 2. Polyimides from 2,2'-oxy(or thio)bis(5-aminobenzenesulfonic acid) 4,4'-oxydianiline, and 4,4'-hexafluoro propylidene-bis(phthalic anhydride)
• Mechanical and Dielectric Properties of a New Polymer Blend Composed of 1, 2-Bis (vinylphenyl) ethane and Thermosetting Poly (phenylene ether) Copolymer Obtained from 2, 6-Dimethylphenol and 2-Allyl-6-methylphenol
• Low Dielectric Loss Copolymer Obtained from 2,6-Dimethylphenol and 2-Allyl-6-methylphenol via Cu-catalyzed Oxidative Coupling Polymerization
• Direct condensation polymerization of N-alkylated p-aminobenzoic acid and packing of rigid-rod main chains with flexible side chains
• A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2',6,6'-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone
• Synthesis and Properties of a Novel High Sensitive Photo-Radical Initiator Based on Biphenyl-2,2'-Dicarboximide Derivatives
• Chemically Amplified Photosensitive Poly(benzoxazole)
• New Convenient Synthetic Route for Photosensitive Poly(benzoxazole)
• Direct Synthesis of Photosensitive Poly(benzoxazole)
• Oxidative Coupling Copolycondensation of 2,6-Dimethylphenol with 2,5-Dimethylphenol : Highly Thermostable Poly(phenylene ether)
• Highly Transparent Photosensitive Polybenzoxazole : Poly(o-hydroxy amide) Derived from 4,4'-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides
• Thermo-base Generator for Low Temperature Solid-phase Imidation of Poly(amic acid)
• A Novel Low Temperature Curable Photosensitive Polybenzoxazole
• Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution
• An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide)
• Efficient Catalyst for Low Temperature Solid-Phase Imidization of Poly(amic acid)
• Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
• Solution-processible Fluorinated Carbazole Derivative for Phosphorescent Organic Light-emitting Diodes
• Synthesis and Properties of 3,8-Bis[4-(9H-carbazol-9-yl)phenyl]-1,10-phenanthroline for Phosphorescent OLEDs
• Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
• New Positive - Type Photosensitive Poly(phenylene ether): Poly(2 - hydroxy - 6 - methylphenol - co - 2, 6 - dimethylphenol) with Diazonaphthoquinone
• Synthesis of High Refractive Index Poly(thioether sulfone)s with High Abbe's Number Derived from 2,5-Bis(sulfanylmethyl)-1,4-dithiane
• A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator
• Biphasic Polycondensation of 4-Bromo-2,6-dimethylphenol Using Silica Gel as a Promoter
• Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines
• A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
• Influence of Polymer Structure in Sulfonated Block Copoly(ether sulfone) Membranes for Fuel Cell Application
• Positive-Working Alkaline Developable Photosensitive and Second-Order Nonlinear Optical Polyimide
• Effect of Cu(II) Ion on the Polycondensation of Octadecyl Esters of Aromatic Amino Acids in Monolayers at the Air/Water Interface
• Polycondensation of Long-chain Esters of Aromatic Amino Acids in Monolayer at the Air/water Interface
• Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines
• Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone
• Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex
• Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator
• Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units
• New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
• Synthesis of Hyperbranched Aromatic Polyamide by Direct Polycondensation Method
• Constitutional Isomerism IV. Synthesis and Characterization of Poly(amide-ester)s From Isophthaloyl Chloride and 4-Aminophenethyl Alcohol
• Synthesis and characterization of high refractive index polyimides derived from 4,4'-(p-phenylenedisulfanyl)dianiline and various aromatic tetracarboxylic dianhydrides
• Compatibility of Polyether Sulfone and Polymide Derived from Isomerization of Polysoimide. An Approach to In-Situ Generated Rigid-Rod Molecular Composite
• In situ Formed Three Layer Film by Isomerization of Fluorinated Polyisoimide in Polyethersulfone as a Matrix Polymer
• Biomimetic Synthesis of a Leaf-opening Factor, Potassium Isolespedezate, by Direct Formation of Enol-glycoside
• Density Functional Theory Calculations of Photoabsoption Spectra of Organic Molecules in the Vacuum Ultraviolet Region
• Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index
• Development of photosensitive poly(hydroxyimide) with high refractive index
• Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator
• Highly refractive and photosensitive polyimide
• Synthesis of block copolymers consisting of poly(3-hexylthiophene) and polystyrene segments through ionic interaction and their self-assembly behavior
• A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
• Convenient Synthesis of Poly(butylene succinate) Catalyzed by Distannoxane
• Synthesis of Poly (3-hexylthiophene) by Using the VO(acac)_2-FeCl_3-O_2 Catalytic System
• A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator
• Control of Molecular Weight Distribution in Polycondensation Polymers. Polyamide Synthesis
• New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator
• New Positive-Type Photosensitive Polyimide: Hyperbranched Poly(Ether-Imide)with Diazonaphthoquinone
• Direct photo-patterning of poly(3-hexylthiophene)
• Chemoselective Polyamidation of 3,3'-Dihydroxybenzidine
• P-93 Synthetic studies of biselides and haterumalides
• Oxidative Coupling Polymerization of 2, 6-Dimethylphenol with a Copper-Amine Catalyst Immobilized within the Interior of SBA-15
• Synthesis of Novel Glass-Forming Liquid Crystals Containing Acrylic Acid Trimer Core Unit and Mesogenic Moiety, and Their Use in Cholesteric Reflection Films
• Synthesis of Hyperbranched Aromatic Poly(ether sulfone) with Sulfonyl Chloride Terminal Groups
• Facile Synthesis of Novel Monodisperse Liquid-crystalline Oligomers Based on Michael Adducts from Millipede Cyanoacetates
• Synthesis of Thermotropic Liquid Crystalline Polyimides with Siloxane Linkages
• Synthesis of Poly(aryl ether) by Pd-Catalyzed Polycondensation
• Synthesis of Aramids by Polycondensation of Aromatic Dicarboxylic Acids with Aromatic Diamines Containing Ether Linkages
• Synthesis of Poly(naphthylene ether) Containing Tetraphenylmethane Group with a Low Dielectric Constant
• Direct Patterning of Poly(ether ether sulfone) Using a Cross-linker and a Photoacid Generator
• Synthesis of Sulfonated Poly (1, 4-diphenoxybenzene) for Proton Exchange Membrane
• Recent Progress of Photosensitive Polyimides
• Chemoselective Polycondensation of 2-Amino-4,6-dichloro-1,3,5-triazine with Aromatic Diamines
• Synthesis of Poly (N-fluoroalkyl benzamide) with Controlled Molecular Weight and Polydispersity Index
• Highly Dielectric and Photo-patternable Gate Insulators for Organic Field-effect Transistors
• A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix [4] resorcinarene and a Photoacid Generator
• Recent Development of Photosensitive Polybenzoxazoles
• pH-responsive Dendritic Gelators
• Synthesis of hyperbranched polymers with controlled degree of branching
• 3,3'-(Phenylphosphinylidene)bis(2(3H)-benzoxazolone) and 3,3'-(phenylphosphinylidene)bis(2(3H)-benzothiazolone). New activating agents.
• N,N'-Carbonyldi(1,2-benzisoxazol-3(2H)-one): New, reactive condensing agent.
• Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone
• "Face-On" Oriented π-Conjugated Polymers Containing 1,3,4-Thiadiazole Moiety Investigated with Synchrotron GIXS Measurements: Relationship between Morphology and PSC Performance

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