Direct photo-patterning of poly(3-hexylthiophene)
スポンサーリンク
概要
著者
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Ueda Mitsuru
Tokyo Inst. Of Technol. Tokyo Jpn
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Saito Yuta
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Higashihara Tomoya
Tokyo Inst. Of Technol. Tokyo Jpn
関連論文
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- Highly Transparent Photosensitive Polybenzoxazole : Poly(o-hydroxy amide) Derived from 4,4'-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides
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- A Novel Low Temperature Curable Photosensitive Polybenzoxazole
- Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution
- An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide)
- Efficient Catalyst for Low Temperature Solid-Phase Imidization of Poly(amic acid)
- Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
- Synthesis of High Refractive Index Poly(thioether sulfone)s with High Abbe's Number Derived from 2,5-Bis(sulfanylmethyl)-1,4-dithiane
- A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator
- A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
- Influence of Polymer Structure in Sulfonated Block Copoly(ether sulfone) Membranes for Fuel Cell Application
- Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines
- Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone
- Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex
- Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator
- Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units
- New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
- Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index
- Development of photosensitive poly(hydroxyimide) with high refractive index
- Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator
- Highly refractive and photosensitive polyimide
- Direct photo-patterning of poly(3-hexylthiophene)
- Highly Dielectric and Photo-patternable Gate Insulators for Organic Field-effect Transistors