A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator
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概要
- 論文の詳細を見る
- 2009-11-05
著者
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UEDA Mitsuru
Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu
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Matsumoto Kazuya
Department of Reproductive and Developmental Biology, The Institute of Medical Science, The Universi
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Matsumoto Kazuya
Department Of Genetic Engineering Graduate School Of Biology Oriented Science And Technology Kinki U
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SAITO Yuta
Department of Ophthalmology, School of Medicine, Showa University
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Ueda Mitsuru
Tokyo Inst. Of Technol. Tokyo Jpn
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Ueda Mitsuru
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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HIGASHIHARA Tomoya
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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Higashihara Tomoya
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Ueda Mitsuru
Department Of Human Sensing And Functional Sensor Engineering Graduate School Of Engineering Yamagat
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Saito Yuta
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Saito Yuta
Department Of Ophthalmology School Of Medicine Showa University
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Higashihara Tomoya
Tokyo Inst. Of Technol. Tokyo Jpn
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Matsumoto Kazuya
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Matsumoto Kazuya
Department Of Applied Chemistry Kanagawa Institute Of Technology
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Ueda Mitsuru
Department Of Chemistry Graduate School Of Pure And Applied Sciences University Of Tsukuba
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Saito Yuta
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Saito Yuta
Department of General Internal Medicine, Aso Iizuka Hospital
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