Chemically Amplified Photosensitive Poly(benzoxazole)
スポンサーリンク
概要
著者
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Shibasaki Y
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Shibasaki Yuji
Tokyo Institute Of Technology
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Shibasaki Y
Tokyo Inst. Of Technol. Tokyo
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Ueda M
Tokyo Inst. Technol. Tokyo
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Ueda M
Tokyo Inst. Technol. Tokyo Jpn
関連論文
- New Positive-type Photosensitive Polyimide Having Sulfo Groups 2. Polyimides from 2,2'-oxy(or thio)bis(5-aminobenzenesulfonic acid) 4,4'-oxydianiline, and 4,4'-hexafluoro propylidene-bis(phthalic anhydride)
- Mechanical and Dielectric Properties of a New Polymer Blend Composed of 1, 2-Bis (vinylphenyl) ethane and Thermosetting Poly (phenylene ether) Copolymer Obtained from 2, 6-Dimethylphenol and 2-Allyl-6-methylphenol
- Low Dielectric Loss Copolymer Obtained from 2,6-Dimethylphenol and 2-Allyl-6-methylphenol via Cu-catalyzed Oxidative Coupling Polymerization
- A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2',6,6'-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone
- Synthesis and Properties of a Novel High Sensitive Photo-Radical Initiator Based on Biphenyl-2,2'-Dicarboximide Derivatives
- Chemically Amplified Photosensitive Poly(benzoxazole)
- New Convenient Synthetic Route for Photosensitive Poly(benzoxazole)
- Direct Synthesis of Photosensitive Poly(benzoxazole)
- Highly Transparent Photosensitive Polybenzoxazole : Poly(o-hydroxy amide) Derived from 4,4'-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides
- Thermo-base Generator for Low Temperature Solid-phase Imidation of Poly(amic acid)
- A Novel Low Temperature Curable Photosensitive Polybenzoxazole
- Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution
- An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide)
- Efficient Catalyst for Low Temperature Solid-Phase Imidization of Poly(amic acid)
- Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
- Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
- Effect of Hydrogen Dilution on Structure of a-Si:H Prepared by Substrate Impedance Tuning Technique : Condensed matter
- Microcrystallization in P-Doped Si:H Films at High Deposition Rate
- Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate
- Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate
- Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
- Annealing Effect on Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate by Substrate Impedance Tuning Technique
- Effect of Annealing on Hydrogenated Amorphous Silicon Prepared at High Deposition Rate
- New Positive - Type Photosensitive Poly(phenylene ether): Poly(2 - hydroxy - 6 - methylphenol - co - 2, 6 - dimethylphenol) with Diazonaphthoquinone
- Positive-Working Alkaline Developable Photosensitive and Second-Order Nonlinear Optical Polyimide
- Photosensitive Polyimides with Second-Order Nonlinear Optical Property
- Effect of Cu(II) Ion on the Polycondensation of Octadecyl Esters of Aromatic Amino Acids in Monolayers at the Air/Water Interface
- Polycondensation of Long-chain Esters of Aromatic Amino Acids in Monolayer at the Air/water Interface
- Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines
- Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone
- Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex
- Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator
- Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units
- New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
- Synthesis and characterization of high refractive index polyimides derived from 4,4'-(p-phenylenedisulfanyl)dianiline and various aromatic tetracarboxylic dianhydrides
- Compatibility of Polyether Sulfone and Polymide Derived from Isomerization of Polysoimide. An Approach to In-Situ Generated Rigid-Rod Molecular Composite
- In situ Formed Three Layer Film by Isomerization of Fluorinated Polyisoimide in Polyethersulfone as a Matrix Polymer
- Synthesis and Characterization of Calix[4]resorcinearene Bearing Azobenzene Moieties as Novel Photofunctional Materials
- A Positive-Working Alkaline Developable Photosensitive Polyimide for Second-Order Nonlinear Optics
- Density Functional Theory Calculations of Photoabsoption Spectra of Organic Molecules in the Vacuum Ultraviolet Region
- DFT Calculations of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157nm Lithography
- A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
- A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator
- Control of Molecular Weight Distribution in Polycondensation Polymers. Polyamide Synthesis
- New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator
- New Positive-Type Photosensitive Polyimide: Hyperbranched Poly(Ether-Imide)with Diazonaphthoquinone