Synthesis and Characterization of Calix[4]resorcinearene Bearing Azobenzene Moieties as Novel Photofunctional Materials

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Chemically Amplified Photosensitive Poly(benzoxazole)
New Convenient Synthetic Route for Photosensitive Poly(benzoxazole)
Direct Synthesis of Photosensitive Poly(benzoxazole)
Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
Effect of Hydrogen Dilution on Structure of a-Si:H Prepared by Substrate Impedance Tuning Technique : Condensed matter
Microcrystallization in P-Doped Si:H Films at High Deposition Rate
Photoinduced Absorption on Phosphorus and Nitrogen Doped a-Si:H Films Prepared at High Deposition-Rate
Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate
Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
Annealing Effect on Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate by Substrate Impedance Tuning Technique
Effect of Annealing on Hydrogenated Amorphous Silicon Prepared at High Deposition Rate
New Positive - Type Photosensitive Poly(phenylene ether): Poly(2 - hydroxy - 6 - methylphenol - co - 2, 6 - dimethylphenol) with Diazonaphthoquinone
Positive-Working Alkaline Developable Photosensitive and Second-Order Nonlinear Optical Polyimide
Photosensitive Polyimides with Second-Order Nonlinear Optical Property
Compatibility of Polyether Sulfone and Polymide Derived from Isomerization of Polysoimide. An Approach to In-Situ Generated Rigid-Rod Molecular Composite
In situ Formed Three Layer Film by Isomerization of Fluorinated Polyisoimide in Polyethersulfone as a Matrix Polymer
Synthesis and Characterization of Calix[4]resorcinearene Bearing Azobenzene Moieties as Novel Photofunctional Materials
A Positive-Working Alkaline Developable Photosensitive Polyimide for Second-Order Nonlinear Optics
Density Functional Theory Calculations of Photoabsoption Spectra of Organic Molecules in the Vacuum Ultraviolet Region
DFT Calculations of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157nm Lithography
A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
The Natural History Model of Hepatitis C Virus Infection and the Economic Evaluation of Alpha Interferon Treatment
A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator
Control of Molecular Weight Distribution in Polycondensation Polymers. Polyamide Synthesis
New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator
New Positive-Type Photosensitive Polyimide: Hyperbranched Poly(Ether-Imide)with Diazonaphthoquinone

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