DFT Calculations of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157nm Lithography
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概要
著者
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Ueda M
Tokyo Inst. Technol. Tokyo
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Ueda M
Tokyo Inst. Technol. Tokyo Jpn
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安藤 慎治
東京工業大学大学院 理工学研究科 物質科学専攻/有機・高分子物質専攻
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Fujigaya Tsuyohiko
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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安藤 慎治
Tokyo Inst. Technol. Tokyo Jpn
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