SHIONO Daiju | New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
スポンサーリンク
概要
関連著者
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HIRAYAMA Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SHIONO Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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HADA Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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Arai Tadashi
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
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SHIRAISHI Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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Lee Seung
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kasai Kohei
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
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YAMAGUCHI Atsuko
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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FUKUDA Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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Yamaguchi Atsuko
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
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UEDA Mitsuru
Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institu
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Ueda M
Tokyo Inst. Technol. Tokyo
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Ueda M
Tokyo Inst. Technol. Tokyo Jpn
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Ogata Toshiyuki
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
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MATSUMARU Shogo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SAKAMIZU Toshio
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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Matsumaru Shogo
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
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KINOSHITA Hiroo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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WATANABE Takeo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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Shiraishi H
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
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Ueda Mitsuru
Department Of Human Sensing And Functional Sensor Engineering Graduate School Of Engineering Yamagat
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Onodera J
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Ueda Mitsuru
Department Of Chemistry Graduate School Of Pure And Applied Sciences University Of Tsukuba
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Yamaguchi Atsuko
ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Akou-gun, Hyogo 678-1205, Japan
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Shiono Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Shiono Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Shiraishi Hiroshi
ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Lee Seung
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Akou-gun, Hyogo 678-1205, Japan
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Hada Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Hada Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Hirayama Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Hirayama Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Onodera Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
著作論文
- Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography