Kasai Kohei | New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
スポンサーリンク
概要
関連著者
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Arai Tadashi
Ulsi Research Department Central Research Laboratory Hitachi Ltd.
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Kasai Kohei
New Technology Development Section Tokyo Ohka Kogyo Co. Ltd.
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HIRAYAMA Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SHIONO Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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HADA Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SHIRAISHI Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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YAMAGUCHI Atsuko
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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FUKUDA Hiroshi
ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.
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Yamaguchi Atsuko
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Ulsi Research Department Center Research Laboratory Hitachi Ltd.
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Yamaguchi Atsuko
ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Shiono Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Shiraishi Hiroshi
ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Hada Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Hirayama Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
著作論文
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography