Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-30
著者
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Lee Seung
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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HIRAYAMA Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SHIONO Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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HADA Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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KINOSHITA Hiroo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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WATANABE Takeo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
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- Human Skeletal Muscle Contractile Properties Assessed by Mechanomyogram during Experimentally-induced Hypothermia and Muscle Fatigue
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Outgassing Analysis in EUV Resist
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- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
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- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
- Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography