Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-30

著者

• Lee Seung

  Laboratory Of Advanced Science And Technology For Industry University Of Hyogo

• KINOSHITA Hiroo

  Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology

• WATANABE Takeo

  Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology

• SHOKI Tsutomu

  HOYA Corporation

• Sakaya Noriyuki

  Hoya Corporation Ngl Development Center

• HAMAMOTO Kazuhiro

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo

• TANAKA Yuzuru

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo

• KAWASHIMA Hirotake

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo

• HOSOKAWA Nobuyuki

  Nitto Thin Film Laboratories Co., Ltd.

• HOSOYA Morio

  HOYA Corporation Electronics Development Center

関連論文

• Phenylplropene A and B, New Inhibitors of Acyl-CoA : Cholesterol Acyltransferase Produced by Penicillium griseofulvum F1959
• Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
• X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
• Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
• Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
• Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
• Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection
• Human Skeletal Muscle Contractile Properties Assessed by Mechanomyogram during Experimentally-induced Hypothermia and Muscle Fatigue
• Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
• Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
• Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
• Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
• A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
• Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
• Phase Defect Observation Using Extreme Ultraviolet Microscope
• Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
• Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU
• Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
• Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes
• Reducing off Hydrocarbon Contaminants for EUVL
• Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
• Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope

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