Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-06-30
著者
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KINOSHITA Hiroo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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WATANABE Takeo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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HADA Hideo
Advanced Material Development Division 1, Tokyo Ohka Kogyo Co., Ltd.
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HAMAMOTO Kazuhiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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KOMANO Hiroshi
Advanced Material Development Division 1, Tokyo Ohka Kogyo Co., Ltd.
関連論文
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
- Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection
- Human Skeletal Muscle Contractile Properties Assessed by Mechanomyogram during Experimentally-induced Hypothermia and Muscle Fatigue
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Phase Defect Observation Using Extreme Ultraviolet Microscope
- Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
- Experimental Results Obtained using Extreme Ultraviolet Laboratory Tool at New SUBARU
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Reducing off Hydrocarbon Contaminants for EUVL
- Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
- Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope