Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
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概要
- 論文の詳細を見る
This paper describes a mask defect inspection system using 13.5 nm light for extreme ultraviolet lithography (EUVL). The Schwarzschild optics which is employed as a microscope optics has a numerical aperture (NA) of 0.3 and a magnification of 30. Furthermore, it has a potential of detecting defects as small as 22 nm on a mask. In order to inspect defects with the phase change induced by swelling of the multilayer, a Mirau interferometer is employed. It is developed that the performance of the optical system, the focal position detection mechanism for image detection while scanning, and the driving mechanism of the reference mirror for the Mirau interference. Since the accuracy of the driving mechanism of the reference was found to be 0.1 nm, enough performance of the ring-shaped piezo actuator for interference measurement was confirmed. Moreover, examples of the mask inspection by this system are shown.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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Lee Seung
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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SHOKI Tsutomu
HOYA Corporation
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HAMAMOTO Kazuhiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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KAWASHIMA Hirotake
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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HOSOKAWA Nobuyuki
Nitto Thin Film Laboratories Co., Ltd.
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HOSOYA Morio
HOYA Corporation Electronics Development Center
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Tanaka Yuzuru
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Sakaya Noriyuki
Hoya Corporation Electro-optics Company R&d Center
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Hosoya Morio
HOYA Corporation Electronics Development Center, 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, Japan
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Hosoya Morio
HOYA Corporation Electro-Optics Company R&D Center, Akishima, Tokyo 196-8510, Japan
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Lee Seung
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
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Shoki Tsutomu
HOYA Corporation Electronics Development Center, 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, Japan
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Sakaya Noriyuki
HOYA Corporation Electronics Development Center, 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, Japan
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Hosokawa Nobuyuki
Nitto Thin Film Laboratories Co., Ltd, 147-1 Myodenji, Rokugohigashine, Rokugo-machi, Senboku-gun, Akita 019-1403, Japan
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Kawashima Hirotake
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
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