Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes

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概要

• 論文の詳細を見る

• The realization of a defect-free mask is a technical problem in extreme ultraviolet lithography (EUVL) technology, which is expected as a next-generation lithography technology. We are therefore proposing and developing the EUV phase-shift microscope for phase-defect inspection. The beam splitter is the key element in this microscope. In this paper, we describe the present situation on the development of the beam splitter. The most inportant issue in beam splitter development is controlling stress. By controlling Ar gas pressure, we controlled stress and thereby successfully developed the beam splitter.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-15

著者

• HOSOKAWA Nobuyuki

  Nitto Thin Film Laboratories Co., Ltd.

• Kinoshita Hiroo

  CREST, JST, Japan

• Hamamoto Kazuhiro

  CREST, JST, Japan

• Watanabe Takeo

  CREST, JST, Japan

• Sakaya Noriyuki

  CREST, JST, Japan

• Shoki Tsutomu

  CREST, JST, Japan

• Hosokawa Nobuyuki

  Nitto Thin Film Laboratories Corporation, Central Laboratory, 147-1 Myodenji, Rokugohigashine, misato-cho, Senboku-gun, Akita 019-1403, Japan

• Hosokawa Nobuyuki

  Nitto Thin Film Laboratories Co., Ltd, 147-1 Myodenji, Rokugohigashine, Rokugo-machi, Senboku-gun, Akita 019-1403, Japan

関連論文

• Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection
• Phase Defect Observation Using Extreme Ultraviolet Microscope
• Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
• Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes

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