Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope
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概要
- 論文の詳細を見る
We have developed a focus detection system for an extreme ultraviolet (EUV) mask inspection system with a high numerical aperture (NA) of 0.3. This system operates in a vacuum environment and needs a high resolution for focus detection, because the depth of focus (DOF) of optics with 0.3 NA becomes $\pm 100$ nm or less. The focus detection system of the glancing-incidence type developed consists of a laser diode, a focusing lens, pinholes, and a dual-segmented photodiode. We achieved a focus sensor resolution of less than 20 nm. Furthermore, using our focus detection system, a vacuum pressure of $1\times 10^{-5}$ Pa was achieved.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-09-15
著者
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HAMAMOTO Kazuhiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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Tanaka Yuzuru
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Watanabe Takeo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
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Tanaka Yuzuru
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
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