Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation
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概要
- 論文の詳細を見る
We evaluated the cleaning characteristics of a 172 nm excimer lamp. The 172 nm excimer lamp was used to irradiate contaminated samples under different conditions, such as various irradiance distances, irradiance environments and atmospheric O2 flow rates that enhance the removal rate. As results, we found the most suitable conditions, which are the absence of surface damage and increasing temperature by irradiation with the 172 nm excimer lamp. Using these conditions, we carried out the cleaning of the Schwarzchild optics used for extreme ultraviolet microscopes. Before cleaning, the total reflectivity of the Schwarzchild optics was only 2.5% because of the adhesion of contamination. However, it was restored to a reflectivity of more than 30% by cleaning. The reflectivity of the Schwarzchild optics was restored to its initial value. We found that 172 nm excimer lamps are very effective for the removal of contamination.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-09-30
著者
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 1-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Hosoya Morio
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Sakaya Noriyuki
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Tanaka Kazuumi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 1-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Watanabe Takeo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 1-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Hamamoto Kazuhiro
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Hamamoto Kazuhiro
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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