Extreme Ultraviolet Resist Development at the University of Hyogo
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概要
- 論文の詳細を見る
A resist for extreme ultraviolet (EUV) lithography requires a small line edge roughness (LER) and a high sensitivity. The achievements of a small LER and a high sensitivity are discussed. One of the candidates for an EUV resist is a main-chain-decomposition-type chemically amplified (CA) resist, such as a methacrylate resist. As a result of outgassing-mass analysis of a methacrylate resist under EUV exposure, we confirmed that the main chain decomposed and this resist has a low outgassing rate compared with an ESCAP-type resist which is a high-annealing-temperature-type CA resist. Another candidate is a photo acid generator (PAG)-bonded CA resist, which has an advantage of a uniform density distribution in the resist system. This resist has an E0 sensitivity of 1.9 mJ/cm2 and a low outgassing rate under EUV exposure. Furthermore, a PAG-bonded resist has a LER of 3 nm (3$\sigma$) and a resolution of 30 nm under electron beam (EB) exposure. It is expected that a PAG-bonded CA resist has a good capability to achieve a small LER and high sensitivity for an EUV resist of a 32 nm node.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-09-30
著者
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Fukushima Yasuyuki
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Fukushima Yasuyuki
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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Ohnishi Ryuji
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan
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Yusa Shinichi
Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2201, Japan
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Suzuki Shota
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan
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Shiotani Hideaki
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Shiotani Hideaki
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Watanabe Takeo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Suzuki Shota
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Suzuki Shota
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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Ohnishi Ryuji
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo 678-1205, Japan
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Ohnishi Ryuji
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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