Development of Extreme Ultraviolet Interference Lithography System
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概要
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Extreme ultraviolet interference lithography was carried out at the long undulator beamline in NewSUBARU. It was confirmed that the spatial coherence length is 1.1 mm using a 10-μm-wide slit in the Young’s double slit experiment. A 25-nm half pitch (hp) resist pattern was successfully replicated by extreme ultraviolet interference lithography (EUV-IL) utilizing a two-window transmission grating pattern of a 50-nm line and space (L/S). For the replication of a 20-nm L/S resist pattern by EUV-IL, we contrived a fabrication process that is suitable for a transmission grating pattern of 40-nm L/S and smaller. Employing a hard-mask process with a silicon dioxide (SiO2) layer on a tantalum–nitride (TaN) layer in the fabrication of a two-window transmission grating, we successfully achieved five times larger dry-etch selectivity in comparison with a non-hard-mask process. As a result, we confirmed the ability to apply this process to a 40-nm hp grating.
- 2010-06-25
著者
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Yasuyuki Fukushima
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Fukushima Yasuyuki
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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Masaki Tada
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Sakagami Naoki
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takafumi Iguchi
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yuya Yamaguchi
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takeo Watanabe
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Hiroo Kinoshita
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Tetsuo Harada
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Kimura Teruhiko
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yoshito Kamaji
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Hiroo Kinoshita
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yuya Yamaguchi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takafumi Iguchi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Naoki Sakagami
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takeo Watanabe
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
関連論文
- Development of Extreme Ultraviolet Interference Lithography System
- Imaging Performance Improvement of an Extreme Ultraviolet Microscope
- Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist
- Dual Grating Interferometric Lithography for 22-nm Node
- Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography
- Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below
- Extreme Ultraviolet Resist Development at the University of Hyogo