Imaging Performance Improvement of an Extreme Ultraviolet Microscope
スポンサーリンク
概要
- 論文の詳細を見る
The extreme ultraviolet microscope (EUVM) has been developed for an actinic mask inspection of a EUV finished mask and a EUV blank mask. Using this microscope, amplitude defects on a finished mask and phase defects on a glass substrate are observed. However, it has a problem of low contrast, which originates from 1) thermal noise of a charge coupled device (CCD) camera, 2) wave aberrations of an optical component, and 3) a nonuniform illumination intensity. To resolve these issues, EUVM was improved. 1) To reduce a thermal noise, a cooled CCD camera is installed. 2) To remove wave aberrations of a back-end turning mirror, a Mo/Si multiplayer-coated thick glass substrate with a high surface accuracy is employed instead of a Si wafer substrate. Furthermore, in situ alignment was carried out to remove wavefront aberrations for a Schwarzschild imaging optics. In addition, 3) by installing a scanning system on the front-end turning mirror, a highly uniform illumination intensity was achieved. As a result, images of less than 100 nm without astigmatism were obtained.
- 2010-06-25
著者
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Yasuyuki Fukushima
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Masaki Tada
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Masaki Tada
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takase Kei
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Kamaji Yoshito
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Sakagami Naoki
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takafumi Iguchi
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yuya Yamaguchi
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Tetsuo Harada
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takeo Watanabe
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Hiroo Kinoshita
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takase Kei
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Tetsuo Harada
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Hiroo Kinoshita
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yuya Yamaguchi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takafumi Iguchi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Kamaji Yoshito
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yoshito Kamaji
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Naoki Sakagami
Laboratory of Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Takeo Watanabe
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
関連論文
- Development of Extreme Ultraviolet Interference Lithography System
- Study on Critical Dimension of Printable Phase Defects Using an Extreme Ultraviolet Microscope: II. Definition of Printable Threshold Region for Hole-Pit Programmed Defects
- Imaging Performance Improvement of an Extreme Ultraviolet Microscope
- Study of Critical Dimensions of Printable Phase Defects Using an Extreme Ultraviolet Microscope