Reducing off Hydrocarbon Contaminants for EUVL
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概要
- 論文の詳細を見る
An extreme ultraviolet (EUV) lithography exposure system is operated in vacuum. During irradiation by EUV light, hydrocarbons were decomposed in vacuum and the surfaces of the imaging optics and mask, which were coated with a Mo/Si multilayer, became contaminated with organic compounds. Thus, the reflectivity and resolution of athe imaging optics and the mask were reduced. In this study, we examined the rate of outgassing and the species that desorb from the structural material, such as those of the wires, the driving motor and the detector in vasuum in vacuum. The rate of outgassing for metals was found to depend on surface roughness. Because the coatings of the wires are made from organic materials, they show the largest figure outgassing rate compared with the structural metal. Furthermore, most of the desorbed hydrocarbons, which are primary contaminants, come from the wires and other components rather than from the metals used for the stages, even though the metals have a large surface area.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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HAMAMOTO Kazuhiro
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
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Tanaka Yuzuru
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Tsubakino Harushige
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
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