Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter
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概要
- 論文の詳細を見る
We developed the extreme ultraviolet (EUV) beam splitter, which is a critical component for resolution enhancement, to achieve the uniform numerical aperture (NA) for all planar directions in the EUV microscope. In the fabrication of the EUV beam splitter, stress control of the Mo/Si multilayer is a necessary to achieve a self-standing membrane of the Mo/Si multilayer. We succeeded with the stress control by optimizing RF power, DC power, and argon working pressure during Mo/Si multilayer deposition. A large effective area of $8\times 10$ mm2, reflectivity of 27%, and transmittance of 17% were achieved simultaneously. Furthermore, by installing the EUV beam splitter in stead of a turning mirror of Schwarzschild optics (SCO), the NA of the SCO became the same in the horizontal and vertical directions on a sample plane. Thus, the 300-nm line and space elbow pattern on an EUV mask for all planar directions was clearly resolved. We have developed an EUV microscope with an EUV beam splitter and succeeded in the highly precise pattern inspection.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-06-25
著者
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Sakaya Noriyuki
Hoya Corporation Electro-optics Company R&d Center
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Osugi Masafumi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Tanaka Kazuumi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Hamamoto Kazuhiro
HOYA Corporation, R&D Center Bldg., 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Tanaka Kazuumi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 1-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Hamamoto Kazuhiro
HOYA Corporation Electro-Optics Company R&D Center, Akishima, Tokyo 196-8510, Japan
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Sakaya Noriyuki
HOYA Corporation, R&D Center Bldg., 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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