Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
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概要
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We discuss the outgassing characteristics under extreme ultraviolet (EUV) exposure for a new resist system based on amorphous low-molecular-weight (Mw) polyphenols consisting of 4,4$'$-methylenebis[2-[di(2-methyl-4-hydroxy-5-cyclohexylphenyl)]methyl] phenol (3M6C-MBSA) compared with polyhydroxystyrene. (PHOST) The outgassing characteristics of the photoresist based on the PHOST resin were better than those of the photoresist based on 3M6C-MBSA as the base material. However, when the same polymer was reacted with a protecting group, the outgassing characteristics were reversed. The decomposition reaction mechanism under EUV exposure is discussed on the basis of results from both mass spectrometry and FT-IR measurements. The results indicate that the reactions of 3M6C-MBSA (Resist B) and PHOST (Resist D) under EUV exposure have different mechanisms. It was confirmed that the decomposition of the molecular backbone is the main reaction for 3M6C-MBSA, whereas the decomposition of the protective group is the main reaction for PHOST.
- 2005-07-15
著者
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Lee Seung
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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HIRAYAMA Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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SHIONO Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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HADA Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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ONODERA Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Akou-gun, Hyogo 678-1205, Japan
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Shiono Daiju
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Lee Seung
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Akou-gun, Hyogo 678-1205, Japan
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Hada Hideo
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Hirayama Taku
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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Onodera Junichi
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-cho, Koza-gun, Kanagawa 253-0114, Japan
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