New Photoresist Based on Amorphous Low Molecular Weight Polyphenols

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• HIRAYAMA Taku

  New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.

• HADA Hideo

  New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.

関連論文

• Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
• Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
• Outgassing Analysis in EUV Resist
• New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
• Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
• Characteristics of CA Resist in EUV Lithography
• Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography

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