Acid-breakable Resin-based Resist for Nanofabrication Electron-beam Lithography

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Arai Tadashi

  Ulsi Research Department Central Research Laboratory Hitachi Ltd.

• SHIRAISHI Hiroshi

  ULSI Research Department, Center Research Laboratory, Hitachi, Ltd.

• Shiraishi H

  Ulsi Research Department Central Research Laboratory Hitachi Ltd.

関連論文

• Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
• Acid-breakable Resin-based Resist for Nanofabrication Electron-beam Lithography
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography

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