Function of Substrate Bias Potential for Formation of Cubic Boron Nitride Films in Plasma CVD Technique
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概要
- 論文の詳細を見る
Cubic BN thin films are formed in RF discharge in B_2H_6 and N_2 at low pressures under a magnetic field to confine the plasma, for negatively self-biased substrate electrodes. Ion bombardment on the growing surface is suggested to play an important role in the formation of cubic BN. The deposited films are characterized by infrared absorption spectroscopy and transmission electron microscopy which show that they are composed of microcrystals of cubic BN with 100-200 Å grain size.
- 社団法人応用物理学会の論文
- 1987-09-20
著者
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OSAKA Yukio
Department of Electrical Engineering, Hiroshima University
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IMURA Takeshi
Department of Electrical Engineering, Osaka University
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CHAYAHARA Akiyoshi
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Osaka Yukio
Department Of Electrical Engineering Faculty Of Engineering Hiroshima University
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Imura T
Mitsubishi Paper Mills Ltd.
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Imura T
Department Of Electrical Engineering Hiroshima University
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Imura Takeshi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Yokoyama H
Electrotechnical Lab. Ibaraki Jpn
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YOKOYAMA Haruki
Department of Electrical Engineering, Hiroshima University
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